| Author(s): |
Kristopher Lavery; Vivek M. Prabhu; Eric K. Lin; Wen-Li Wu; Sushil K. Satija; Kwang-Woo Choi; M Wormington; |
| Title: |
Lateral Length Scales of Latent Image Roughness as Determined by Off-Specular Neutron Reflectivity |
| Published: |
February 14, 2008 |
| Abstract: |
A combination of specular and off-specular neutron reflectometry was used to measure the buried lateral roughness of the reaction-diffusion front in a model extreme ultraviolet lithography photoresist. Compositional heterogeneity at the latent reaction-diffusion front has been proposed as a major cause of line edge roughness in photolithographic features. This work marks the first experimental observation of the longitudial and lateral compositional heterogeneity of a latent image, revealing the buried lateral length scale as well as the amplitude of inhomogeneity at the reaction-diffusion front. These measurements aid in determining the origins of line edge roughness formation, while exploring the materials limits of the current chemically amplified photoresists. |
| Citation: |
Applied Physics Letters |
| Volume: |
92 |
| Pages: |
3 pp. |
| Keywords: |
diffusion;line edge roughness;neutron reflectivity;off-specular reflectivity;photolithography |
| Research Areas: |
Polymers |
| PDF version: |
 Click here to retrieve PDF version of paper (814KB) |
