Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Kristopher Lavery; Vivek M. Prabhu; Eric K. Lin; Wen-Li Wu; Sushil K. Satija; Kwang-Woo Choi; M Wormington;|
|Title:||Lateral Length Scales of Latent Image Roughness as Determined by Off-Specular Neutron Reflectivity|
|Published:||February 14, 2008|
|Abstract:||A combination of specular and off-specular neutron reflectometry was used to measure the buried lateral roughness of the reaction-diffusion front in a model extreme ultraviolet lithography photoresist. Compositional heterogeneity at the latent reaction-diffusion front has been proposed as a major cause of line edge roughness in photolithographic features. This work marks the first experimental observation of the longitudial and lateral compositional heterogeneity of a latent image, revealing the buried lateral length scale as well as the amplitude of inhomogeneity at the reaction-diffusion front. These measurements aid in determining the origins of line edge roughness formation, while exploring the materials limits of the current chemically amplified photoresists.|
|Citation:||Applied Physics Letters|
|Keywords:||diffusion,line edge roughness,neutron reflectivity,off-specular reflectivity,photolithography|
|PDF version:||Click here to retrieve PDF version of paper (833KB)|