NIST Authors in Bold
| Author(s): | Brian Berry; August W. Bosse; Jack F. Douglas; Ronald L. Jones; Alamgir Karim; |
|---|---|
| Title: | Orientational Order in Block Copoloymer Films Zone Annealed Below the Order-Disorder Transition Temperature |
| Published: | August 11, 2008 |
| Abstract: | Cold zone annealing (CZA) is a thermal treatment involving pulling a thin block copolymer (BCP) film over a heated region having a temperature significantly above the glass-transition temperature, but well below the film order-disorder temperature. We investigate the potential of CZA for controlling defects in block copolymer thin films and as a platform for studying defect formation, annihilation, and dynamics. The dramatic increase in orientational order obtained by CZA relative to conventional oven annealing methods is attributed to the large in-plane mobility gradient that accompanies the in-plane temperature gradient in glassy polymeric materials. This mobility gradient leads to a progressive alignment of cylinders in the sample pulling direction and presumably to a substantial modification of the defect annihilation dynamics during grain growth. |
| Citation: | Nano Letters |
| Volume: | 7 |
| Issue: | 9 |
| Pages: | pp. 2789 - 2794 |
| Keywords: | block copolymers;defects;order;orientation;zone annealing |
| Research Areas: | Thin-Films, Polymers |
| PDF version: | Click here to retrieve PDF version of paper (556KB) |