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|Author(s):||Ronald L. Jones; T Hu; Christopher L. Soles; Eric K. Lin; R M. Reano; Stella W. Pang; D M. Casa;|
|Title:||Real Time Shape Evolution of Nanoimprinted Polymer Structures During Thermal Annealing|
|Published:||July 18, 2006|
|Abstract:||The real time shape of nanoimprinted polymer patterns are measured as a function of annealing temperature and time using a new metrology technique, Critical Dimension Small Angle X-ray Scattering (CD-SAXS). Periodicity, linewidth, line height, and sidewall angle are reported both below and above the bulk glass transition temperature (TG) for a nanoimprinted line/space pattern of poly(methyl methacrylate) (PMMA). For T > TG, shape changes are accelerated in early stages due to the reduction of high energy corners, yielding to a slowed rate in longer time regimes.|
|Pages:||pp. 1723 - 1728|
|Keywords:||dimensional metrology,glass transition temperature,Nanoimprint Lithography,nanomechanics,small angle x-ray scattering|
|PDF version:||Click here to retrieve PDF version of paper (222KB)|