Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Vivek M. Prabhu; B D. Vogt; Wen-Li Wu; Eric K. Lin; Jack F. Douglas; Sushil K. Satija; D L. Goldfarb; H Ito;|
|Title:||Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films|
|Published:||July 19, 2005|
|Abstract:||The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counterion depletion near the substrate and enrichment near the periphery of the film extending into the solution. These observations challenge our understanding of the charge distribution in polyelectrolyte films and are important for understanding film dissolution in medical and technological applications.|
|Pages:||pp. 6647 - 6651|
|Keywords:||aqueous base,dissolution,lithography,nanotechnology,neutron reflectivity,photoresist,polyelectrolyte,swelling,thin film|
|PDF version:||Click here to retrieve PDF version of paper (165KB)|