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Publication Citation: Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues

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Author(s): E Jablonski; Vivek M. Prabhu; S Sambasivan; Daniel A. Fischer; Eric K. Lin; D L. Goldfarb; M Angelopolous; H Ito;
Title: Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues
Published: September 01, 2004
Abstract:
Conference: SPIE Advanced Lithography
Proceedings: Proceedings of SPIE
Volume: 5376
Pages: 10 pp.
Location: Santa Clara, CA
Dates: February 1, 2004
Keywords: airborne molecular contaminants;blend miscibility;NEXAFS
Research Areas: Polymers
PDF version: PDF Document Click here to retrieve PDF version of paper (954KB)