| Author(s): |
David L. VanderHart; Vivek M. Prabhu; Eric K. Lin; |
| Title: |
Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate |
| Published: |
July 13, 2004 |
| Abstract: |
The intimacy of component mixing in 2 blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(t-butylphenyl) iodonium perfluorooctane sulfonate (PFOS) were studied by solid state proton NMR. Mass ratios were 91/9 and 85/15 PHS/PFOS. These are simplified model blends for certain photoresist formulations used in the electronics industry. Multiple-pulse NMR techniques are used in both spin-diffusion and longitudinal relaxation experiments at ambient temperatures. It is deduced that PFOS is mixed with PHS on a molecular scale for PFOS mass fractions at or below 0.15; hence, the 2 components are thermodynamically miscible in this range. An attempt was also made to support the notion of intimate PFOS/PHS mixing by looking for evidence of 1H-19F dipolar broadening in multiple-pulse blend spectra. This attempt was not successful owing to rapid polarization-exchange between 19F nuclei. |
| Citation: |
Chemistry of Materials |
| Volume: |
16 |
| Issue: |
16 |
| Pages: |
pp. 3074 - 3084 |
| Keywords: |
iodonium sulfonate;miscibility;NMR;photoresist;poly(hydroxystyrene) photoacid generator;proton spin diffusion |
| Research Areas: |
Polymers |
| PDF version: |
 Click here to retrieve PDF version of paper (169KB) |
