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|Author(s):||David L. VanderHart; Vivek M. Prabhu; Eric K. Lin;|
|Title:||Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate|
|Published:||July 13, 2004|
|Abstract:||The intimacy of component mixing in 2 blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(t-butylphenyl) iodonium perfluorooctane sulfonate (PFOS) were studied by solid state proton NMR. Mass ratios were 91/9 and 85/15 PHS/PFOS. These are simplified model blends for certain photoresist formulations used in the electronics industry. Multiple-pulse NMR techniques are used in both spin-diffusion and longitudinal relaxation experiments at ambient temperatures. It is deduced that PFOS is mixed with PHS on a molecular scale for PFOS mass fractions at or below 0.15; hence, the 2 components are thermodynamically miscible in this range. An attempt was also made to support the notion of intimate PFOS/PHS mixing by looking for evidence of 1H-19F dipolar broadening in multiple-pulse blend spectra. This attempt was not successful owing to rapid polarization-exchange between 19F nuclei.|
|Citation:||Chemistry of Materials|
|Pages:||pp. 3074 - 3084|
|Keywords:||iodonium sulfonate,miscibility,NMR,photoresist,poly(hydroxystyrene) photoacid generator,proton spin diffusion|
|PDF version:||Click here to retrieve PDF version of paper (174KB)|