NIST Authors in Bold
| Author(s): | W Li; A I. Frenkel; Joseph C. Woicik; C Ni; S I. Shah; |
|---|---|
| Title: | Dopant Location Identification in Nd3+-Doped TiO2 Nanoparticles |
| Published: | Date Unknown |
| Abstract: | Doping large bandgap semiconductors is typically done in order to enhance photocatalytic, photovoltaic and other chemical and optoelectronic properties. The identification of dopant position and its local environment is essential to exploring the doping functions for TiO2 applications. X-ray techniques including extended x-ray absorption fine structure, x-ray photoelectron spectroscopy, and x-ray diffraction, were performed to analyze the Nd (0-1.5 at.%) location and lattaice structural change in anatase TiO2 nanoparticles. Nd ions were determined to have trivalent chemical state and be situated in the places of Ti4+. The substitutional Nd3+ ions cause anatase lattice expansion along c-direction and the local structure changes towards rutile-like configuration. Compared with pure TiO2, the bond lengths of Nd-O1 (first O shell) and Nd-Ti1 (first Ti shell) are also enlarged by 0.5 A and 0.8 A, respectively. |
| Citation: | Applied Physics Letters |
| Keywords: | dopants;nanoparticles;Nd;TiO2 |
| Research Areas: | Characterization, Ceramics |