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NIST Authors in Bold
|Author(s):||Sasa Bajt; H N. Chapman; E Spiller; S Hau-Riege; J Alameda; A J. Nelson; C C. Walton; B Kjornrattanawanich; Andrew Aquila; Charles S. Tarrio; Steven E. Grantham;|
|Title:||Multilayers for Next Generation X-Ray Sources|
|Abstract:||Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons and x-ray free electron lasers) requires advances in x-ray optics. Newly developed multilayer-based mirrors and optical elements enabled efficient band-pass filtering, focusing and time resolved measurements in recent FLASH (Free Electron LASer in Hamburg) experiments. These experiments are providing invaluable feedback on the response of the multilayer structures to high intensity, short pulsed x-ray sources. This information is crucial to design optics for future x-ray free electron lasers and to benchmark computer codes that simulate damage processes.|
|Keywords:||free electron laser,multilayer,optics damage|