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|Author(s):||J C. Garno; Christopher D. Zangmeister; J Batteas;|
|Title:||Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers|
|Published:||July 01, 2007|
|Abstract:||Automated scanned probe lithography has been employed to form nanoscale Cu structures through electroless metal deposition onto patterned carboxylic acid terminated self-assembled monolayers. Using this approach, Cu structures of ~ 40 nm 200 nm in lateral dimension by ~ 4 nm 6 nm in thickness were formed. Precise control of the patterning process and deposition solution conditions affords sub-nm control of the patterned architectures. The application of this process for the construction of organic based optoeletronics is discussed.|
|Citation:||Journal of the American Chemical Society|
|Pages:||pp. 7874 - 7879|
|Keywords:||AFM,molecular electronics,nanolithography,nanoscale materials,optolectronics|