| Author(s): |
J C. Garno; Christopher D. Zangmeister; J Batteas; |
| Title: |
Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers |
| Published: |
July 01, 2007 |
| Abstract: |
Automated scanned probe lithography has been employed to form nanoscale Cu structures through electroless metal deposition onto patterned carboxylic acid terminated self-assembled monolayers. Using this approach, Cu structures of ~ 40 nm 200 nm in lateral dimension by ~ 4 nm 6 nm in thickness were formed. Precise control of the patterning process and deposition solution conditions affords sub-nm control of the patterned architectures. The application of this process for the construction of organic based optoeletronics is discussed. |
| Citation: |
Journal of the American Chemical Society |
| Volume: |
23 |
| Pages: |
pp. 7874 - 7879 |
| Keywords: |
AFM;molecular electronics;nanolithography;nanoscale materials;optolectronics |
| Research Areas: |
Nanotechnology |
