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|Author(s):||Terrence J. Jach; S M. Durbin; A S. Bakulin; David S. Bright; C B. Stagarescu; G Srajer; D. Haskel; J Pedulla;|
|Title:||Wide-Field X-Ray Microscopy with Kirkpatrick-Baez Optics|
|Published:||December 01, 2001|
|Abstract:||Modern technology permits us to fabricate Kirkpatrick-Baez (KB) multilayer optics with performance close to the theoretical limit. We have constructed a KB field-imaging microscope which operates in the x-ray energy range 6-10 keV with a field of view of 40 - 150 m. The optics perform at a reflectivity of 80% at the first Bragg peak. Using highly collimated synchrotron radiation, we are able to realize a resolution of 900 nm at an energy of 9 keV. The intensity and magnification are sufficient to perform real-time imaging with a CCD x-ray camera, with increases in field of view and resolution at this energy due to improvements in both collection and image processing. The collimation of the incident radiation corresponds to K hler illumination. The dynamic range of the images using a 12-bit camera allows us to extend the field of view at the Bragg reflection over several Kiessig fringes. We have adjusted the energy to take advantage of absorption at the excitation edges of elements and have performed imaging using circularly polarized radiation. We have used this at the excitation edges of elements and have performed imaging using circularly polarized radiation. We have used this instrucment to demonstrate wide-field imaging in both absorption and diffraction. We present magnified images of multiple layers in a test integrated circuit in absorption and of a metal single crystal in diffraction.|
|Conference:||Proceedings of SPIE--the International Society for Optical Engineering|
|Proceedings:||X-Ray Micro- and Nano-Focusing: Applications and Techniques, Conference | | X-Ray Micro- and Nano-Focusing: Applications and Techniques II | SPIE|
|Dates:||July 30-31, 2001|