NIST Authors in Bold
| Author(s): | Steven W. Robey; |
|---|---|
| Title: | Anisotropic Microstructure Development During the Reaction of Mg With GaAs |
| Published: | February 18, 1998 |
| Abstract: | Reaction of Mg with GaAs (001) surface occurs at substrate temperatures above 250 K and leads to 3D growth of an epitaxial, cubic reaction phase with a lattice constant of 0.62 + 0.02nm, 9% larger than GaAs. The resulting anistotropic, 3-demiensional (3D) heteroepitaxial microstructure was studied using in situ electron diffraction and Auger spectroscopy and ex situ atomic force microscopy (AFM). 3D structures develop that are elongated alone the GaAs [110] direction with aspect ratios (length-to-width) up to 20. These structures appear to be composed of isotropic islands from which elongated, tapered ridges extend in on direction along [110]. Analysis of AFM images and size distributions suggest a critical size for the initiation of ridge formation and a discontinuous, stepwise ridge development. Potential origins of this interesting microstructure are discussed. |
| Citation: | Journal of Vacuum Science and Technology B |
| Volume: | 16 |
| Pages: | pp. 2413 - 2416 |
| Keywords: | AFM;GaAs;Mg;thin film reaction |
| Research Areas: | Chemistry |