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Publication Citation: Metal Patterning Using Tailored Functional Group Chemistry: Selective, Electroless Deposition of Metals on Self-Assembled Monolayers

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Author(s): Christopher D. Zangmeister; Roger D. van Zee;
Title: Metal Patterning Using Tailored Functional Group Chemistry: Selective, Electroless Deposition of Metals on Self-Assembled Monolayers
Published: September 16, 2003
Abstract: This study investigates the attachment of copper particles to self-assembled monolayers of mercaptobenzoic acids (MBA) on gold substrates. The carboxylate functional group of the MBAs coordinates with metal ions in solution and facilitates the electroless deposition of metals on top of the monolayer. Infrared spectroscopy was used to evaluate the formation of MBA monolayers on gold before and after the metal was deposition. atomic-force microscopy images show that 200 nm of copper is deposited on 4-MBA monolayers after 30 min of exposure to a copper plating solution. Copper deposits are not observed on 3-MBA monolayers, which suggests that the position of the carboxylic acid functionality on MBA may dictate the formation of copper deposits in this chemical system. On surfaces that were microcontact-printed with 4-MBA, copper deposited only on those areas where the monolayer was patterned. This study suggests that electroless deposition may be a viable strategy for attaching electrodes to molecules in nanoelectronic applications.
Citation: Langmuir
Volume: 19
Issue: 19
Pages: pp. 8065 - 8068
Keywords: electroless deposition;mercaptobenzoic acids;microcontact-printing;self-assembled monolayers
Research Areas: Nanochemistry, Nanoelectronics and Nanoscale Electronics