NIST Authors in Bold
| Author(s): | David J. Vanderah; Marlon L. Walker; Mark A. Rocco; Kenneth A. Rubinson; |
|---|---|
| Title: | Self-Assembled Monolayers of an Oligo(ethylene oxide) Disulfide and its Corresponding Thiol Assembled From Water: Characterization and Protein Resistance |
| Published: | February 05, 2008 |
| Abstract: | The self-assembled monolayers (SAMs) of the ?-methyl oligo(ethylene oxide) disulfide [S(CH2CH2O)6CH3]2, [S(EO)6]2 {OEO disulfide}, on Au from 95 % ethanol and from water are described. Spectroscopic ellipsometry and reflection-absorption infrared spectroscopy data indicate the [S(EO)6]2 films are similar to the disordered films of HS(CH2CH2O)6CH3, (EO)6, and HS(CH2)3O(CH2CH2O)5CH3, C3EO5, at their protein adsorption minima. However, unlike the (EO)6 and C3EO5 thiols, the [S(EO)6]2 films are self-limiting in their surface packing density and sustain film thickness of 1.0 nm to 1.3 nm, corresponding to 50 % to 65 % coverage, over extended periods of time. As a result, OEO disulfides offer an attractive motif for the generation of thin, protein rejecting surfaces. |
| Citation: | Langmuir |
| Volume: | 24 |
| Issue: | 3 |
| Pages: | pp. 826 - 829 |
| Keywords: | Oligo(ethylene oxide) disulfides;self-assembled monolayers (SAMs) |
| Research Areas: | Organic Analytical Chemistry |