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|Author(s):||John A. Dagata; Natalia Farkas; R Ramsier;|
|Title:||High-voltage Nanoimprint Lithography of Refractory Metal Film|
|Published:||July 01, 2010|
|Abstract:||Local oxidation of metal, semiconductor, and polymer surfaces has provided a common basis from which to explore fundamental principles of nanolithography and prototype functional nanostructures for many years now. This article summarizes an investigation of local oxidation for iron and Group IV metal thin films using both scanning probe microscopy and high-voltage nanoimprinting methods. We illustrate how the underlying kinetics of metal oxidation in the presence of nitrogen, which is incorporated into the metal film during the growth process, is dramatically enhanced compared with that of single-crystal silicon. We then go on to demonstrate subsequent selective etching of latent features and a potential magnetic application.|
|Citation:||Journal of Nanoscience and Nanotechnology|
|Pages:||pp. 4423 - 4433|
|Keywords:||scanning probe microscopy, nanoimprint lithography, metal-nitride thin films|
|Research Areas:||Metrology, Nanomanufacturing, Manufacturing|