| Author(s): |
Ndubuisi G. Orji; Ronald G. Dixson; B Bunday; J Allgair; |
| Title: |
Towards Accurate Feature Shape Metrology |
| Published: |
March 22, 2008 |
| Abstract: |
Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM) is one such instrument. The lateral scanning capability and the shape of the CD-AFM probe enable direct access to the feature sidewall. This produces profile information that could be used as a process monitor. Due to their relative insensitivity to material properties, CD-AFMs have been used as reference measurement systems (RMS) for measurands such as width. We present a technique for calculating the uncertainty of sidewall angle measurements using a CD-AFM. We outline an overall calibration strategy; address the uncertainty sources for such measurements, including instrument-related, and parameter extraction related, and how the calibration is transferred to workhorse instruments. |
| Proceedings: |
Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XXII
|
| Volume: |
6922 |
| Issue: |
2 |
| Pages: |
pp. 692208.1 - 692208.9 |
| Location: |
San Jose, CA |
| Dates: |
February 22-29, 2008 |
| Keywords: |
sidewall angle; critical dimension atomic force microscope; uncertainty |
| Research Areas: |
Metrology, Nanomanufacturing, Manufacturing |
