| Author(s): |
Steven D. Phillips; Daniel S. Sawyer; Bruce R. Borchardt; D E. Ward; D E. Beutel; |
| Title: |
A Novel Artifact for Testing Large Coordinate Measuring Machines |
| Published: |
January 01, 2001 |
| Abstract: |
We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over large distances, e.g. over four meters, with an uncertainty of less than one part per million. The artifact is relatively inexpensive, robust for use in reasonable industrial environments, and significantly reduces testing time over traditional step gauge measurements. |
| Citation: |
Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology |
| Volume: |
25 |
| Issue: |
1 |
| Pages: |
pp. 29 - 34 |
| Keywords: |
CMM;interferometry;laser;step gauge |
| Research Areas: |
Metrology, Manufacturing |
