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Publication Citation: Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons

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Author(s): Richard M. Silver; Ravikiran Attota; Egon Marx;
Title: Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons
Published: June 18, 2007
Abstract: This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) a series of model-to-experiment comparisons. A part of the study will cover improved model-to-theory agreement obtained using our new Scatterfield microscopy technique, which has enabled evaluation of previous unquantified errors. The Scatterfield microscopy technique allows us to step or scan an aperture in a conjugate back focal plane of the objective lens enabling illumination of a narrow cone of incident plane waves at a given primary angle of incidence. A series of angle resolved images or intensity data can be obtained for each angle of illumination.
Conference: Modeling Aspects in Optical Metrology
Proceedings: Proceedings of SPIE
Volume: 6617
Pages: 13 pp.
Location: Munich, GE
Dates: January 1, 2007
Keywords: background normalization;CCD camera;diffraction;higher order;optics;scatterfield;zero order
Research Areas: Metrology, Manufacturing