Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Richard M. Silver; Ravikiran Attota; Egon Marx;|
|Title:||Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons|
|Published:||June 18, 2007|
|Abstract:||This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) a series of model-to-experiment comparisons. A part of the study will cover improved model-to-theory agreement obtained using our new Scatterfield microscopy technique, which has enabled evaluation of previous unquantified errors. The Scatterfield microscopy technique allows us to step or scan an aperture in a conjugate back focal plane of the objective lens enabling illumination of a narrow cone of incident plane waves at a given primary angle of incidence. A series of angle resolved images or intensity data can be obtained for each angle of illumination.|
|Conference:||Modeling Aspects in Optical Metrology|
|Proceedings:||Proceedings of SPIE|
|Dates:||January 1, 2007|
|Keywords:||background normalization,CCD camera,diffraction,higher order,optics,scatterfield,zero order|
|Research Areas:||Metrology, Manufacturing|