| Author(s): |
Richard M. Silver; Ravikiran Attota; Egon Marx; |
| Title: |
Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons |
| Published: |
June 18, 2007 |
| Abstract: |
This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) a series of model-to-experiment comparisons. A part of the study will cover improved model-to-theory agreement obtained using our new Scatterfield microscopy technique, which has enabled evaluation of previous unquantified errors. The Scatterfield microscopy technique allows us to step or scan an aperture in a conjugate back focal plane of the objective lens enabling illumination of a narrow cone of incident plane waves at a given primary angle of incidence. A series of angle resolved images or intensity data can be obtained for each angle of illumination. |
| Conference: |
Modeling Aspects in Optical Metrology |
| Proceedings: |
Proceedings of SPIE |
| Volume: |
6617 |
| Pages: |
13 pp. |
| Location: |
Munich, GE |
| Dates: |
January 1, 2007 |
| Keywords: |
background normalization;CCD camera;diffraction;higher order;optics;scatterfield;zero order |
| Research Areas: |
Metrology, Manufacturing |
