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Publication Citation: Telepresence:  A New Paradigm for Solving Contamination Problems

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Author(s): Michael T. Postek; Marylyn H. Bennett; N J. Zaluzec;
Title: Telepresence:  A New Paradigm for Solving Contamination Problems
Published: January 01, 1999
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full complement of analytical tools in a fab that would be necessary to identify very small particles and processing anomalies. Enter the world of Telepresence Microscopy (TPM) to provide a solution. Part of the mission of the National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. industry. The successful development of a collaboratory for telepresence microscopy provides an important new tool to promote technology transfer in the areas of measurement technology. Telepresence microscopy is an advanced concept in the integration of computers and high-speed networks with scientific instruments for operation, control, communication, and research. NIST and Texas Instruments,  under the auspices of the National Automated Manufacturing Testbed (NAMT) and in collaboration with the University of Illinois (UIC) and Argonne National Laboratory (ANL), have developed a collaboratory testbed.The goal of this work is to demonstrate the value of TPM within organizations having a large distributed manufacturing facility such as Texas Instruments (TI) and between scientific research organizations such as NIST, ANL, and UIC. Large distributed manufacturing sites need rapid response when problems threaten to disrupt multi-million dollar production facilities. This is particularly important when expertise needed to solve the problem is not locally present. The resulting delays are inevitable and often costly. Telepresence minimizes these delays.  Once a sample has been received by a research facility, collaborators from multiple remotely located sites can rapidly access the collaboratory from their respective locations and collaborate in real-time to solve the problem using only their desktop computers and connections to the Internet. This presentation demonstrates the power afforded by this technology.
Conference: Electrochemical Society
Proceedings: Proceedings of the Electrochemical Society
Volume: 99
Issue: 16
Pages: pp. 331 - 341
Location: Unknown, USA
Dates: October 18-19, 1999
Keywords: collaboratory;internet;metrology;scanning electron microscope;telepresence;transmission electron microscope
Research Areas: Metrology, Manufacturing