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Publication Citation: The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST

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Author(s): V W. Tsai; Theodore V. Vorburger; Ronald G. Dixson; Joseph Fu; R Koning; Richard M. Silver; E. C. Williams;
Title: The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST
Published: January 01, 1998
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lattice constant of silicon, have considerable potential as a AFM calibration artifact at the sub-nanometer range. A metrology AFM developed at NIST, called the calibrated AFM (C-AFM), is used to measure this type of surface. In this paper, the results of six sets of measurements made over a period of five months are presented. The calculation of the step algorithm and the uncertainty of the measurement are introduced and discussed briefly.
Conference: International Conference on Characterization and Metrology for ULSI Technology
Proceedings: 1998 International Conference on Characterization and Metrology for ULSI Technology
Location: Gaithersburg, MD
Dates: April 28, 1998
Keywords: calibration;SPM Metrology;step height
Research Areas: Metrology, Manufacturing