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Publication Citation: Damping mechanisms for precision applications in UHV environment

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Author(s): Sumanth B. Chikkamaranahalli; R. R. Vallance; Bradley N. Damazo; Richard M. Silver;
Title: Damping mechanisms for precision applications in UHV environment
Published: May 01, 2006
Abstract: Surface analysis techniques such as scanning probe microscopy (SPM) have undergone significant advances and are attractive for application to electron and optical devices such as micro lenses, vacuum tubes, electron tubes, etc. For surface stability purposes, these experiences are carried out in ultra high vacuum (UHV) conditions where pressure ranges between 10-9 Torr and 10-11 Torr. The performance of instruments such as scanning tunneling microscope (STM), atomic force mircoscope (AFM) is also affected by external vibrations, so effective isolation of the instrument from these sources is vital. In this article, we review some of the traditional damping methods that are used in UHV environment to minimize vibrations and we discuss their advantages and disadvantages.
Conference: American Society for Precision Engineering 2006 Spring Topical Meeting: Challenges at the Intersection of Precision Engineering and Vacuum Technology
Location: Pittsburgh, PA
Dates: May 1-2, 2006
Keywords: eddy current;piezoelectric;vibration isolation system;visoelastic
Research Areas: Nanomanufacturing