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Publication Citation: Simulation of Optical Microscope Images for Photomask Feature Size Measurements

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Author(s): Egon Marx; James E. Potzick;
Title: Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published: July 03, 2005
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of the measurement process because the image does not otherwise yield an accurate value of the dimension being measured. The integral equation form of Maxwell's equations is used in the simulation process described here.
Conference: 2005 Digest of IEEE Antennas and Propagation Society International Symposium
Volume: 3B
Pages: pp. 2116 - 2119
Location: Unknown, USA
Dates: July 3-8, 2005
Keywords: linewidth metrology;Maxwell's equations;optical image modeling;photomasks
Research Areas: Metrology, Manufacturing