Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Egon Marx; James E. Potzick;|
|Title:||Simulation of Optical Microscope Images for Photomask Feature Size Measurements|
|Published:||January 01, 2005|
|Abstract:||Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of the measurement process because the image does not otherwise yield an accurate value of the dimension being measured. The integral equation form of Maxwell's equations is used in the simulation process described here.|
|Conference:||1998 Digest of the IEEE Antennas and Propagation Society International Symposium|
|Proceedings:||Proceedings of 2005 Digest of the IEEE Antennas and Propagation Society International Symposium|
|Pages:||pp. 2116 - 2119|
|Dates:||January 1, 2005|
|Keywords:||linewidth,Maxwell equations,photomask,simulated microscope images,singular integral equations|
|Research Areas:||Metrology, Manufacturing|