| Abstract: |
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect of quality control. The application of Fourier analysis techniques to the analysis of SEM images is a useful methodology for sharpness measurement. In this paper, a statistical measure known as the multivariate kurtosis is proposed as an additional useful measure of the sharpness of SEM images. Kurtosis is designed to be a measure of the degree of departure of a probability distribution. For selected SEM images, the two-dimensional spatial Fourier transforms were computed. Then the bivariete kurtosis of this Fourier transform was calculated as though it were a probability distribution, Kurtosis has the distinct advantage that it is a parametric (I.e., a dimensionless) measure and is sensitive to the presence of the high spatial frequencies necessary for acceptable levels of image sharpness. The applications of this method to SEM metrology will be dissussed. |
