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Publication Citation: Application of Transmission Electron Detection to SCALPEL Mask Metrology

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Author(s): R Farrow; Michael T. Postek; William J. Keery; Samuel N. Jones; J R. Lowney; M Blakey; L Fetter; J Griffith; J E. Liddle; L C. Hopkins; H A. Huggins; M Peabody,; A Novembre;
Title: Application of Transmission Electron Detection to SCALPEL Mask Metrology
Published: November 01, 1997
Abstract: Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0.24 um were measured on the mask. The thin membrane mask structure that was used is found to provide sufficient transmitted signal contrast at energies ranging from 10 to 30 keV. The linewidth measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is concluded that the linewidth measurement technique using transmitted electrons is suitable for the potential certification of SCALPEL mask standards.
Citation: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume: 15(6)
Pages: pp. 2167 - 2172
Keywords: electron scattering,electrons,linewidth measurement,SCALPEL mask linewidth standards,SCALPEL mask metrology,transmission electron detection
Research Areas: Metrology, Manufacturing
PDF version: PDF Document Click here to retrieve PDF version of paper (341KB)