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|Author(s):||Michael T. Postek; Andras Vladar; M P. Davidson;|
|Title:||Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology|
|Published:||July 01, 1997|
|Abstract:||The utility of the sharpness concept for use on metrology scanning electron microscopes (SEM) as implemented through the Fourier transform technique has been clearly demonstrated and documented. The original methods for sharpness analysis were labor-intensive and, therefore, not suited to industrial applications like the semiconductor integrated circuit production. We have integrated these techniques into an easy to use and stand alone software package called SEMMON which makes the analysis easy and, moreover, can serve as a prototype for integration into a production tool. This paper will present the general philosophy of the system and analytical data taken from both laboratory and production instruments to prove both the relevance of the sharpness concept and the usefulness of this tool for SEM performance monitoring.|
|Conference:||Scanning Probe Metrology I|
|Proceedings:||Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor|
|Pages:||pp. 68 - 79|
|Location:||Santa Clara, CA|
|Dates:||March 10, 1997|
|Keywords:||Fourier,image analysis,metrology,performance,resolution,scanning electron microscope,sharpness|
|Research Areas:||Metrology, Manufacturing|