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|Author(s):||T Mcwaid; J Schneir;|
|Title:||The Development of a Calibrated Atomic Force Microscope|
|Published:||January 01, 1994|
|Abstract:||Advances in the manufacture of integrated circuits, x-ray optics, magnetic read-write heads, optical data storage media, razor blades, etc. require advances in ultraprecision metrology. Each of these industries is currently investigating the use of Atomic Force Microscopy (AFM) to improve the precision and accuracy of their manufacturing process control measurements. To facilitate the use of AFM for manufacturing we are developing a specially designed AFM system that we call the Calibrated AFM (CAFM). The CAFM will be used to calibrate artifacts which, in turn, can be used to calibrate commercial AFMs. The system design goals are first presented. The critical electro-mechanical and metrology issues involved in the design, construction and operation of the CAFM are then summarized. The current status and performance of the instrument is then presented. The effects of stage stiffness on system performance are discussed in depth. Finally, plans for the future development of the instrument are summarized.|
|Proceedings:||Proceedings of ASPE|
|Research Areas:||Metrology, Manufacturing|