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|Author(s):||Loucas G. Christophorou; James K. Olthoff;|
|Title:||Electron Interactions With SF6|
|Published:||January 01, 2000|
|Abstract:||Sulfur hexafluoride (SF6) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF6 is comprehensively reviewed and critically assessed. Cross sections are presented and discussed for the following scattering processes: total electron scattering; differential elastic; elastic integral; elastic momentum; total vibrational; total and partial ionization; total dissociative and nondissociative electron attachment; dissociation into neutrals. Coefficients for electron-impact ionization, effective ionization, electron attachment , electron drift, and electron diffusion are also reviewed and assessed.|
|Citation:||Journal of Physical and Chemical Reference Data|
|Pages:||pp. 267 - 330|
|Keywords:||coefficients,cross sections,electron scattering,electron swarms,electron transport,ionization,SF6,sulfur hexafluoride|
|Research Areas:||Electrical Metrology|
|PDF version:||Click here to retrieve PDF version of paper (40MB)|