| Author(s): |
Loucas G. Christophorou; James K. Olthoff; |
| Title: |
Electron Interactions With SF6 |
| Published: |
January 01, 2000 |
| Abstract: |
Sulfur hexafluoride (SF6) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF6 is comprehensively reviewed and critically assessed. Cross sections are presented and discussed for the following scattering processes: total electron scattering; differential elastic; elastic integral; elastic momentum; total vibrational; total and partial ionization; total dissociative and nondissociative electron attachment; dissociation into neutrals. Coefficients for electron-impact ionization, effective ionization, electron attachment , electron drift, and electron diffusion are also reviewed and assessed. |
| Citation: |
Journal of Physical and Chemical Reference Data |
| Volume: |
29 |
| Issue: |
3 |
| Pages: |
pp. 267 - 330 |
| Keywords: |
;coefficients;cross sections;electron scattering;electron swarms;electron transport;ionization;SF6;sulfur hexafluoride; |
| Research Areas: |
Electrical Metrology |
| PDF version: |
 Click here to retrieve PDF version of paper (38MB) |
