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|Author(s):||James K. Olthoff; Yicheng Wang;|
|Title:||Studies of Ion Bombardment in High Density Plasmas Containing CF4|
|Published:||July 01, 1999|
|Abstract:||We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C4, and in CF4: Ar and CF4:O2:Ar mixtures. Abundant ionic species, including secondary ions such as CO+ and COF+, were observed and their implications are discussed.|
|Citation:||Journal of Vacuum Science and Technology A|
|Pages:||pp. 1552 - 1555|
|Keywords:||carbon tetrafluoride,CF4,cleaning plasmas,etching plasmas,inductively coupled plasmas,ion energy distributions,ion flux|
|Research Areas:||Electronics & Telecommunications|
|PDF version:||Click here to retrieve PDF version of paper (3MB)|