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Publication Citation: Studies of Ion Bombardment in High Density Plasmas Containing CF4

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Author(s): James K. Olthoff; Yicheng Wang;
Title: Studies of Ion Bombardment in High Density Plasmas Containing CF4
Published: July 01, 1999
Abstract: We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C4, and in CF4: Ar and CF4:O2:Ar mixtures. Abundant ionic species, including secondary ions such as CO+ and COF+, were observed and their implications are discussed.
Citation: Journal of Vacuum Science and Technology A
Issue: 4
Pages: pp. 1552 - 1555
Keywords: ;carbon tetrafluoride;CF4;cleaning plasmas;etching plasmas;inductively coupled plasmas;ion energy distributions;ion flux;
Research Areas: Electronics & Telecommunications
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