| Author(s): |
James K. Olthoff; Yicheng Wang; |
| Title: |
Studies of Ion Bombardment in High Density Plasmas Containing CF4 |
| Published: |
July 01, 1999 |
| Abstract: |
We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C4, and in CF4: Ar and CF4:O2:Ar mixtures. Abundant ionic species, including secondary ions such as CO+ and COF+, were observed and their implications are discussed. |
| Citation: |
Journal of Vacuum Science and Technology A |
| Issue: |
4 |
| Pages: |
pp. 1552 - 1555 |
| Keywords: |
;carbon tetrafluoride;CF4;cleaning plasmas;etching plasmas;inductively coupled plasmas;ion energy distributions;ion flux; |
| Research Areas: |
Electronics & Telecommunications |
| PDF version: |
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