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|Author(s):||W Yu; J A. Bain; Willard C. Uhlig; John Unguris;|
|Title:||The Effect of Stress Induced Anisotropy in Patterned FeCo Thin Film Structures|
|Published:||April 24, 2006|
|Abstract:||In this work, 1 υm thick FeCeo films with -320 MPa compressive stress and FeCo/NiFe films with 600 MPa tensile stress were patterened into 5υm x 20 υm elements. The stress anisotropy resulting from patterning was measured using x-ray diffraction to be 220 MPa for the tensile films and -170 MPa for the compressive films and are in afreement with the finite element modelling. SEMPA imaging shows that the domain structure of the elements was influenced by the stress induced anisotropy. Calculattions of the effect of stress anisotropy were performed on domain congurations for the patterened structures. Results indicate that tensile stresses should reinforce closure domains, while compressive stresses of magnitude greater than 50 MPa should result in easy axis rotation, and is in agreement with the experimental results.|
|Citation:||Journal of Applied Physics|
|Keywords:||FeCo,magnetic domains,NiFe,patterned films,stress|