Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Jabez J. McClelland; R Gupta; Robert Celotta; G Porkolab;|
|Title:||Nanostructure Fabrication by Reactive-ion Etching of Laser-Focused Chromium on Silicon|
|Published:||January 01, 1998|
|Abstract:||We have fabricated chromium nanostructures on silicon by laser-focused atomic deposition, and have further processed these structures by reactive-ion etching in an SF6 plasma. We show that the result can be an array of parallel wires as narrow as 68 nm, or an array of parallel Si trenches as narrow as 85nm. The laser-focused deposition process is inherently parallel, so a large area is patterned simultaneously with an accurate periodicity of 212.78 nm. This method represents a novel way to make large, coherent arrays of sub-100 nm-size structures.|
|Citation:||Applied Physics B-Lasers and Optics|
|Pages:||pp. 95 - 98|
|Research Areas:||Nanofabrication, Nanomanufacturing, and Nanoprocessing|
|PDF version:||Click here to retrieve PDF version of paper (236KB)|