NIST logo

Publication Citation: Nanostructure Fabrication by Reactive-ion Etching of Laser-Focused Chromium on Silicon

NIST Authors in Bold

Author(s): Jabez J. McClelland; R Gupta; Robert Celotta; G Porkolab;
Title: Nanostructure Fabrication by Reactive-ion Etching of Laser-Focused Chromium on Silicon
Published: January 01, 1998
Abstract: We have fabricated chromium nanostructures on silicon by laser-focused atomic deposition, and have further processed these structures by reactive-ion etching in an SF6 plasma. We show that the result can be an array of parallel wires as narrow as 68 nm, or an array of parallel Si trenches as narrow as 85nm. The laser-focused deposition process is inherently parallel, so a large area is patterned simultaneously with an accurate periodicity of 212.78 nm. This method represents a novel way to make large, coherent arrays of sub-100 nm-size structures.
Citation: Applied Physics B-Lasers and Optics
Volume: 66
Pages: pp. 95 - 98
Research Areas: Nanofabrication, Nanomanufacturing, and Nanoprocessing
PDF version: PDF Document Click here to retrieve PDF version of paper (236KB)