Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Laser Focused Atomic Deposition

NIST Authors in Bold

Author(s): Jabez J. McClelland; R E. Scholten; R Gupta; Robert Celotta;
Title: Laser Focused Atomic Deposition
Published: January 01, 1994
Abstract: We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm x 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of-principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.
Conference: SPIE, Laser Techniques for Surface Science
Proceedings: Proceedings of SPIE, Volume 2125, Photochemistry and Processing
Volume: 60
Issue: No. 3
Pages: pp. 324 - 327
Location: Los Angeles, CA
Dates: January 22-29, 1994
Keywords: atom optics,chromium,laser-focused deposition,nanostructures,surface diffusion,surface growth
Research Areas: Nanofabrication, Nanomanufacturing, and Nanoprocessing
PDF version: PDF Document Click here to retrieve PDF version of paper (302KB)