Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Jabez J. McClelland; R E. Scholten; R Gupta; Robert Celotta;|
|Title:||Laser Focused Atomic Deposition|
|Published:||January 01, 1994|
|Abstract:||We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm x 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of-principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.|
|Conference:||SPIE, Laser Techniques for Surface Science|
|Proceedings:||Proceedings of SPIE, Volume 2125, Photochemistry and Processing|
|Pages:||pp. 324 - 327|
|Location:||Los Angeles, CA|
|Dates:||January 22-29, 1994|
|Keywords:||atom optics,chromium,laser-focused deposition,nanostructures,surface diffusion,surface growth|
|Research Areas:||Nanofabrication, Nanomanufacturing, and Nanoprocessing|
|PDF version:||Click here to retrieve PDF version of paper (302KB)|