| Author(s): |
Jabez J. McClelland; R E. Scholten; R Gupta; Robert Celotta; |
| Title: |
Laser Focused Atomic Deposition |
| Published: |
January 01, 1994 |
| Abstract: |
We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm x 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of-principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism. |
| Conference: |
SPIE, Laser Techniques for Surface Science |
| Proceedings: |
Proceedings of SPIE, Volume 2125, Photochemistry and Processing |
| Volume: |
60 |
| Issue: |
No. 3 |
| Pages: |
pp. 324 - 327 |
| Location: |
Los Angeles, CA |
| Dates: |
January 22-29, 1994 |
| Keywords: |
atom optics;chromium;laser-focused deposition;nanostructures;surface diffusion;surface growth |
| Research Areas: |
Nanofabrication, Nanomanufacturing, and Nanoprocessing |
| PDF version: |
 Click here to retrieve PDF version of paper (295KB) |
