| Author(s): |
Jabez J. McClelland; John Unguris; R E. Scholten; Daniel T. Pierce; |
| Title: |
Simple, Compact, High-Purity Cr Evaporator for UHV |
| Published: |
September 01, 1993 |
| Abstract: |
A simple, compact Cr evaporator is constructed by electroplating Cr metal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min-1 (flux {asymp} 1019 atoms m-2s-1) have been obtained, with total deposition thickness in excess of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum show impurities below detectability. |
| Citation: |
Journal of Vacuum Science and Technology A |
| Volume: |
11 |
| Issue: |
5 |
| Pages: |
pp. 2863 - 2864 |
| Research Areas: |
Instrumentation |
