Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Mapping substrate/film adhesion with contact-resonance-frequency AFM

NIST Authors in Bold

Author(s): Donna C. Hurley; Malgorzata Kopycinska-Mueller; Eric Langlois; Tony B. Kos; Nicholas Barbosa;
Title: Mapping substrate/film adhesion with contact-resonance-frequency AFM
Published: July 12, 2006
Abstract: We demonstrate contact-resonance-frequency atomic force microscopy (AFM) techniques to nondestructively image variations in adhesion at a substrate/film interface. Contact-resonance-frequency imaging is a dynamic AFM technique to measure the contact stiffness between the tip and the sample. Although typically used to evaluate local elastic modulus, we show here that the contact stiffness can also be used to assess another mechanical property, namely subsurface adhesion. Images were acquired on a sample containing a 20 nm gold (Au) blanket film on silicon (Si)with a 1 nm patterned interlayer of titanium (Ti). This design produced regions of very weak adhesion (Au/Si interface) and regions of strong adhesion (Au/Ti/Si). Values of the contact stiffness were 5 % lower in the regions of weak adhesion. The observed behavior is consistent with theoretical predictions for layered systems with disbonds. Our results represent progress towards quantitative measurement of adhesion parameters on the nanoscale. Such measurement capabilities have important implications for the successful development of thin-film devices, especially in emerging nanotechnology applications.
Citation: Applied Physics Letters
Volume: 89
Pages: pp. 021911-1 - 021911-3
Keywords: atomic force acoustic microscopy (AFAM),contact stiffness,thin films
Research Areas: Nanomaterials
PDF version: PDF Document Click here to retrieve PDF version of paper (256KB)