Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Electrical Methods for Mechanical Characterization of Interconnect Thin Films

NIST Authors in Bold

Author(s): Robert R. Keller; Cynthia A. Volkert; Roy H. Geiss; Andrew J. Slifka; David T. Read; Nicholas Barbosa; Reiner Monig;
Title: Electrical Methods for Mechanical Characterization of Interconnect Thin Films
Published: September 01, 2005
Abstract: We describe the use of electrical methods for evaluating mechanical reliability and properties of patterned copper and aluminum interconnects on silicon substrates. The approach makes use of controlled Joule heating, which causes thermal strains in the materials system due to differences in thermal expansion between the metal and constraining substrate and passivation. Our efforts concentrate on understanding damage formation in the interconnects and on the development of meaningful test methods. We make use of alternating currents in a frequency range (100 Hz to 10 kHz) that does not lead to electromigration but instead causes extensive thermal fatigue damage and failure in the metal interconnects.
Conference: Advanced Metallization Conf.
Proceedings: Advanced Metallization Conf., Proc.
Volume: 21
Pages: pp. 643 - 648
Location: Colorado Springs, CO
Dates: September 26-29, 2005
Keywords: aluminum interconnects,copper interconnects,electrical testing,interconnect reliability,mechanical properties,thermal fatigue
Research Areas: Electronics & Telecommunications
PDF version: PDF Document Click here to retrieve PDF version of paper (415KB)