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Publication Citation: Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF3, and its Mixtures with Argon

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Author(s): Yicheng Wang; Loucas G. Christophorou; James K. Olthoff; J. K. Verbrugge;
Title: Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF3, and its Mixtures with Argon
Published: December 01, 1998
Abstract: Measurements are reported of (i) the electron drift velocity in pure trifluoromethane (CHF3) gas and in its mixtures with argon, and (ii) electron attachment in pure CHF3. The E/N dependence on the electron drift velocity in mixtures exhibits regions of distinct negative differential conductivity. The values of the electron attachment coefficients in pure CHF3 are small and decrease with E/N. The measurements were made at room temperature and over the E/N range from 0.05 X 10-17 V cm-2 to 60 x 10-17 V cm2 (0.05 Td to 60 Td, 1 Td = 10-17 V cm2). The electron attachment rate constant is virtually independent of E/N below about 50 x 10-17 V cm2 and equal to {difference} 13 x 10-14 cm3 S-1. This small attachment rate constant may be due to impurities.
Proceedings: Proc., Intl. Symp. on Gaseous Dielectrics
Pages: pp. 39 - 44
Location: Virginia Beach, VA
Dates: June 2-5, 1998
Keywords: ;CHF3;drift velocity;electron attachment;
Research Areas: Electronics & Telecommunications
PDF version: PDF Document Click here to retrieve PDF version of paper (4MB)