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Publication Citation: The Origins of Random Telegraph Noise in Highly Scaled SiON nMOSFETs

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Author(s): Jason P. Campbell; Jin Qin; Kin P. Cheung; Liangchun Yu; John S. Suehle; A Oates; Kuang Sheng;
Title: The Origins of Random Telegraph Noise in Highly Scaled SiON nMOSFETs
Published: October 17, 2008
Abstract: Random telegraph noise (RTN) has recently become an important issue in advanced circuit performance. It has also recently been used as a tool for gate dielectric defect profiling. In this work, we show that the widely accepted model thought to govern RTN behavior cannot be used to describe our experimental observations. The basis of this model (charge exchange between inversion layer and bulk oxide defects via tunneling) is inconsistent with our RTN observations on advanced SiON nMOSFETs with 1.4 nm physical gate oxide thickness. Alternatively, we show that RTN is qualitatively consistent with the capture and emission of inversion charge by interface states. Our results suggest that a large body of the low-frequency noise literature very likely needs to be re-interpreted.
Proceedings: 2008 IEEE International Integrated Reliability Workshop
Pages: pp. 105 - 109
Location: South Lake Tahoe, NV
Dates: October 12-16, 2008
Research Areas: Semiconductors
PDF version: PDF Document Click here to retrieve PDF version of paper (422KB)