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|Author(s):||Donna C. Hurley; M Kopycinski-Muller; Eric Langlois; Anthony B. Kos; N. Barbosa;|
|Title:||Mapping substrate/film adhesion with contact-resonance-frequency atomic force microscopy|
|Published:||July 12, 2006|
|Abstract:||We have used contact-resonance-frequency atomic force microscopy techniques to nondestructively image variations in adhesion as a buried interface. Images were acquired on a sample containing a 20nm gold (Au) blanket film on silicon (Si) with a 1 nm patterned interlayer of titanium (Ti). This design produced regions of very weak adhesion (Si/Au) and regions of strong adhesion (Si/Ti/Au). Values of the contact stiffness were 5% lower in the regions of weak adhesion. The observed behavior is consistent with theoretical predictions for layered systems with disbonds. Our results represent progress towards quantitative measurement of adhesion parameters on the nanoscale.|
|Citation:||Applied Physics Letters|
|Pages:||pp. 021911-1 - 021911-3|
|PDF version:||Click here to retrieve PDF version of paper (253KB)|