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|Author(s):||James P. Randa; Tom McKay; Susan L. Sweeney; David K. Walker; Lawrence Wagner; David R. Greenberg; Jon Tao; G. Ali Rezvani;|
|Title:||Reverse Noise Measurement and Use in Device Characterization|
|Published:||June 10, 2006|
|Abstract:||We review the concept of reverse noise measurements in the context of on-wafer transistor noise characterization. Several different applications of reverse noise measurements are suggested and demonstrated. Reverse measurements can be used to check measurement results, to significantly reduce the uncertainty in Γ optu , to reduce the occurence of unphysical results, and possibly to directly measure or constrain parameters in model of transistors.|
|Conference:||2006 IEEE RADIO FREQUENCY INTEGRATED CIRCUITS SYMPOSIUM JUNE 11-13, 2006|
|Location:||SAN FRANCISCO, CA|
|Dates:||June 11-13, 2006|
|Keywords:||CMOS, noise, noise measurements, on-wafer measurements|
|Research Areas:||Electronics & Telecommunications, Microelectronics, Electromagnetics|
|PDF version:||Click here to retrieve PDF version of paper (189KB)|