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|Author(s):||Sangita S. Kalarickal; Pavol Krivosik; Mingzhong Wu; C E. Patton; Michael L. Schneider; Pavel Kabos; Thomas J. Silva; John P. Nibarger;|
|Title:||Ferromagnetic resonance linewidth in metallic thin films: Comparison of measurement methods|
|Published:||May 22, 2006|
|Abstract:||Strip line (SL), vector network analyzer (VNA), and pulsed inductive microwave magnetometer (PIMM) techniques were used to measure the ferromagnetic resonance (FMR) linewidth for a series of Permalloy films with thicknesses of 50 and 100 nm. The SL-FMR measurements were made for fixed frequencies from 1.5 to 5.5 GHz. The VNA-FMR and PIMM measurements were made for fixed in-plane fields from 1.6 to 8 kA/m (20-100 Oe). The results provide a confirmation, lacking until now, that the linewidths measured by these three methods are consistent and compatible. In the field format, the linewidths are a linear function of frequency, with a slope that corresponds to a nominal Landau-Lifshitz phenomenological damping parameter α value of 0.007 and zero frequency intercepts in the 160-320 A/m (2-4 Oe) range. In the frequency format, the corresponding linewidth versus frequency response shows a weak upward curvature at the lowest measurement frequencies and a leveling off at high frequencies.|
|Citation:||Journal of Applied Physics|
|Pages:||pp. 1 - 7|
|PDF version:||Click here to retrieve PDF version of paper (415KB)|