Publication Citation
NIST Authors in Bold
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| Author(s): | Ken L. Stricklett; J. M. Kassoff; James K. Olthoff; Richard J. Van Brunt; |
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| Title: | Appearance Potentials of Ions Produced by Electron-Impact Induced Dissociative Ionization of SF6 and Related Compounds |
| Published: | March 01, 1995 |
| Abstract: | Methods are described, which are based on the use of a commercial mass spectrometer, for determination of ionization and fragment ion appearance potentials by electron impact. These methods are applied to the principal sulfur-bearing compounds produced by decomposition of SF6 by electrical discharges. The compounds investigated include: SF4, SO2, SOF2, SO2F2, SOF4, SF5Cl, S2F10, S2OF10, and S2O2F10, as well as SF6. Experimental conditions are recommended for improved sensitivity to trace levels of these decomposition by-products in SF6. |
| Proceedings: | Proc., Intl. Symp. on Gaseous Dielectrics |
| Pages: | pp. 257 - 264 |
| Location: | Knoxville, TN |
| Dates: | April 24-28, 1994 |
| Keywords: | ;appearance potential;decomposition by-products;electron impact ionization;ionization potential;sulfur hexafluoride; |
| Research Areas: | Electrical Metrology |
| PDF version: |  Click here to retrieve PDF version of paper (4MB) |