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|Author(s):||Ken L. Stricklett; J. M. Kassoff; James K. Olthoff; Richard J. Van Brunt;|
|Title:||Appearance Potentials of Ions Produced by Electron-Impact Induced Dissociative Ionization of SF6 and Related Compounds|
|Published:||March 01, 1995|
|Abstract:||Methods are described, which are based on the use of a commercial mass spectrometer, for determination of ionization and fragment ion appearance potentials by electron impact. These methods are applied to the principal sulfur-bearing compounds produced by decomposition of SF6 by electrical discharges. The compounds investigated include: SF4, SO2, SOF2, SO2F2, SOF4, SF5Cl, S2F10, S2OF10, and S2O2F10, as well as SF6. Experimental conditions are recommended for improved sensitivity to trace levels of these decomposition by-products in SF6.|
|Proceedings:||Proc., Intl. Symp. on Gaseous Dielectrics|
|Pages:||pp. 257 - 264|
|Dates:||April 24-28, 1994|
|Keywords:||appearance potential,decomposition by-products,electron impact ionization,ionization potential,sulfur hexafluoride|
|Research Areas:||Electrical Metrology|
|PDF version:||Click here to retrieve PDF version of paper (4MB)|