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|Author(s):||James P. Randa; Robert L. Billinger;|
|Title:||On-Wafer Measurements of Noise Temperature|
|Published:||December 01, 1999|
|Abstract:||The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results of tests performed to verify our ability to measure on-wafer noise temperature. With known off-waver-noise sources, several different configurations were used to obtain different, known, on-waver noise temperatures. These were then measured, and the results were compared to predictions. Good agreement was found, with a worst-case disagreement of 2.6 percent. An uncertainty analysis of the measurements resulted in an estimated standard uncertainty (1 ς of 1.1 percent or less for most values of noise temperature. The tests also confirm our ability to produce known noise temperature on wafer, with an uncertainty of about 1 percent.|
|Citation:||IEEE Transactions on Instrumentation and Measurement|
|Pages:||pp. 1259 - 1269|
|Keywords:||noise,noise measurement,noise temperature,on-wafer noise,thermal noise|
|Research Areas:||Electronics & Telecommunications, Microelectronics, Electromagnetics|
|PDF version:||Click here to retrieve PDF version of paper (183KB)|