| Author(s): |
James P. Randa; Robert L. Billinger; Joseph P. Rice; |
| Title: |
On-Wafer Measurements of Noise Temperature |
| Published: |
December 01, 1999 |
| Abstract: |
The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results of tests performed to verify our ability to measure on-wafer noise temperature. With known off-waver-noise sources, several different configurations were used to obtain different, known, on-waver noise temperatures. These were then measured, and the results were compared to predictions. Good agreement was found, with a worst-case disagreement of 2.6 percent. An uncertainty analysis of the measurements resulted in an estimated standard uncertainty (1 ς of 1.1 percent or less for most values of noise temperature. The tests also confirm our ability to produce known noise temperature on wafer, with an uncertainty of about 1 percent. |
| Citation: |
IEEE Transactions on Instrumentation and Measurement |
| Volume: |
48 |
| Issue: |
6 |
| Pages: |
pp. 1259 - 1269 |
| Keywords: |
noise;noise measurement;noise temperature;on-wafer noise;thermal noise; |
| Research Areas: |
Electronics & Telecommunications, Microelectronics, Electromagnetics |
| PDF version: |
 Click here to retrieve PDF version of paper (179KB) |
