NIST Authors in Bold
| Author(s): | Loucas G. Christophorou; James K. Olthoff; |
|---|---|
| Title: | Electron Interactions with CF3I |
| Published: | January 01, 2000 |
| Abstract: | Low-energy electron collision data for the plasma processing gas CF3I are sparse. Limited cross section data are available only for total and differential elastic electron scattering, electron-impact ionization, and electron attachment processes. These data are synthesized, assessed, and discussed in this paper. There is a need for further scrutiny of these data and for measurements of the cross sections of the other main electron-collision processes. There is a need also for measurements of the electron transport, ionization, and attachment coefficients of this molecule |
| Citation: | J. Phys. & Chem. Ref. Data (JPCRD) - |
| Volume: | 29 |
| Issue: | 4 |
| Pages: | pp. 553 - 570 |
| Keywords: | ;CF3I;electron interactions;trifluoroiodomedthane; |
| Research Areas: | Electronics & Telecommunications |
| PDF version: | Click here to retrieve PDF version of paper (7MB) |