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|Author(s):||Dylan F. Williams; Roger Marks; A. Davidson;|
|Title:||Comparison of On-Wafer Calibrations|
|Published:||December 01, 1991|
|Abstract:||A powerful new verification technique determines the measurement accuracy of scattering parameter calibrations. The technique determines the relative reference impedance, reference plane offset, and the worst-case measurement deviations of any calibration from a benchmark calibration. The technique is applied to several popular on-wafer scattering parameter calibrations, and the deviations between those calibrations and the thru-reflect line calibration are quantified.|
|Proceedings:||Tech Dig., Auto. RF Tech. Group Conf.|
|Pages:||pp. 68 - 81|
|Location:||San Diego, CA|
|DOI:||http://dx.doi.org/10.1109/ARFTG.1991.324040 (Note: May link to a non-U.S. Government webpage)|
|PDF version:||Click here to retrieve PDF version of paper (672KB)|