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Publication Citation: Comparison of On-Wafer Calibrations

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Author(s): Dylan F. Williams; Roger Marks; A. Davidson;
Title: Comparison of On-Wafer Calibrations
Published: December 01, 1991
Abstract: A powerful new verification technique determines the measurement accuracy of scattering parameter calibrations. The technique determines the relative reference impedance, reference plane offset, and the worst-case measurement deviations of any calibration from a benchmark calibration. The technique is applied to several popular on-wafer scattering parameter calibrations, and the deviations between those calibrations and the thru-reflect line calibration are quantified.
Proceedings: Tech Dig., Auto. RF Tech. Group Conf.
Volume: 20
Pages: pp. 68 - 81
Location: San Diego, CA
Research Areas: Electromagnetics
DOI: http://dx.doi.org/10.1109/ARFTG.1991.324040  (Note: May link to a non-U.S. Government webpage)
PDF version: PDF Document Click here to retrieve PDF version of paper (672KB)