Publication Citation
NIST Authors in Bold
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| Author(s): | Mark A. Sobolewski; James K. Olthoff; Yicheng Wang; |
|---|---|
| Title: | Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor |
| Published: | April 01, 1999 |
| Abstract: | |
| Citation: | Journal of Applied Physics |
| Volume: | 85 |
| Issue: | 8 |
| Pages: | pp. 3966 - 3975 |
| Research Areas: | Electronics & Telecommunications |
| PDF version: |  Click here to retrieve PDF version of paper (14MB) |