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Publication Citation: Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor

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Author(s): Mark A. Sobolewski; James K. Olthoff; Yicheng Wang;
Title: Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor
Published: April 01, 1999
Abstract:
Citation: Journal of Applied Physics
Volume: 85
Issue: 8
Pages: pp. 3966 - 3975
Research Areas: Electronics & Telecommunications
PDF version: PDF Document Click here to retrieve PDF version of paper (15MB)