| Author(s): |
Yicheng Wang; Loucas G. Christophorou; James K. Olthoff; J. K. Verbrugge; |
| Title: |
Electron Drift and Attachment in CHF3 and its Mixtures With Argon |
| Published: |
May 01, 1999 |
| Abstract: |
Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities. |
| Citation: |
Chemical Physics Letters |
| Pages: |
pp. 303 - 308 |
| Keywords: |
;CHF3;electron attachment;electron drift velocity;electron transport; |
| Research Areas: |
Electronics & Telecommunications |
| PDF version: |
 Click here to retrieve PDF version of paper (2MB) |
