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|Author(s):||Yicheng Wang; Loucas G. Christophorou; James K. Olthoff; J. K. Verbrugge;|
|Title:||Electron Drift and Attachment in CHF3 and its Mixtures With Argon|
|Published:||May 01, 1999|
|Abstract:||Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.|
|Citation:||Chemical Physics Letters|
|Pages:||pp. 303 - 308|
|Keywords:||CHF3,electron attachment,electron drift velocity,electron transport|
|Research Areas:||Electronics & Telecommunications|
|PDF version:||Click here to retrieve PDF version of paper (2MB)|