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Publication Citation: Electron Drift and Attachment in CHF3 and its Mixtures With Argon

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Author(s): Yicheng Wang; Loucas G. Christophorou; James K. Olthoff; J. K. Verbrugge;
Title: Electron Drift and Attachment in CHF3 and its Mixtures With Argon
Published: May 01, 1999
Abstract: Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.
Citation: Chemical Physics Letters
Pages: pp. 303 - 308
Keywords: ;CHF3;electron attachment;electron drift velocity;electron transport;
Research Areas: Electronics & Telecommunications
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