NIST Authors in Bold
| Author(s): | Loucas G. Christophorou; James K. Olthoff; |
|---|---|
| Title: | Electron Attachment Cross Sections and Negative Ion States of SF6 |
| Published: | January 01, 2001 |
| Abstract: | A comprehensive and critical assessment of published data on the total, dissociative, and nondissociative electron attachment cross sections for SF6 allowed us to recommend or suggest room temperature values for these cross sections over an energy range from 0.0001 eV to 15 eV. The total electron attachment cross section is dominated by the formation of SF66u-^ below {approximately equal to}0.2 eV, by the formation of SF5- between {approximately equal to}0.3 eV and 1.5 eV, and by the formation of F- beyond {approximately equal to}2.0 eV. This work, along with electron scattering and theoretical data, allowed us also to identify the energies and symmetry assignments of the negative ion states of SF6 below {approximately equal to}15 eV. |
| Citation: | International Journal of Mass Spectrometry |
| Pages: | pp. 27 - 41 |
| Keywords: | ;dissociative attachment;electron attachment;electron scattering;negative ion states;SF6;sulfur hexafluoride; |
| Research Areas: | Electronics & Telecommunications |
| PDF version: | Click here to retrieve PDF version of paper (6MB) |