Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Electron Attachment Cross Sections and Negative Ion States of SF6

NIST Authors in Bold

Author(s): Loucas G. Christophorou; James K. Olthoff;
Title: Electron Attachment Cross Sections and Negative Ion States of SF6
Published: January 01, 2001
Abstract: A comprehensive and critical assessment of published data on the total, dissociative, and nondissociative electron attachment cross sections for SF6 allowed us to recommend or suggest room temperature values for these cross sections over an energy range from 0.0001 eV to 15 eV. The total electron attachment cross section is dominated by the formation of SF66u-^ below {approximately equal to}0.2 eV, by the formation of SF5- between {approximately equal to}0.3 eV and 1.5 eV, and by the formation of F- beyond {approximately equal to}2.0 eV. This work, along with electron scattering and theoretical data, allowed us also to identify the energies and symmetry assignments of the negative ion states of SF6 below {approximately equal to}15 eV.
Citation: International Journal of Mass Spectrometry
Pages: pp. 27 - 41
Keywords: dissociative attachment,electron attachment,electron scattering,negative ion states,SF6,sulfur hexafluoride
Research Areas: Electronics & Telecommunications
PDF version: PDF Document Click here to retrieve PDF version of paper (7MB)