Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Yicheng Wang; Amanda N. Goyettes; Martin Misakian; James K. Olthoff;|
|Title:||Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar|
|Published:||September 01, 2000|
|Abstract:||We have determined the relative abundances and energy distributions of positive ions in high density plasmas generated in CHF3, C2F6 and CH2FCF3 and their mixtures with Ar using an ion energy analyzer-mass spectrometer appended to the lower electrode of an inductively coupled GEC radio-frequency reference cell. CHF3 and C2F6, which are commonly used in plasma processing, possess high global warming potentials. CH2FCF3 , which is a popular refrigerant used in the air-conditioning industry, has a much lower global warming potential and may serve as a novel etching alternative. We find the ion composition and plasma characteristics of CH2FCF3 discharges to be similar to those for CHF3.|
|Proceedings:||Proc. XIII International Conference on Gas Discharges and Their Applications|
|Pages:||pp. 655 - 658|
|Dates:||September 3-8, 2000|
|Keywords:||CHF3,C2F6,CH2FCF2,gas discharges ,ion energy distributions|
|Research Areas:||Electronics & Telecommunications|
|PDF version:||Click here to retrieve PDF version of paper (2MB)|