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The Development of Standard Reference Material 2137 - A Boron Implant in Silicon Standard for Secondary Ion Mass Spectrometry

Published

Author(s)

David S. Simons, P Chi, Robert G. Downing, George P. Lamaze
Citation
Semiconductor Characterization Present Status and Future Needs
Publisher Info
AIP Press, Woodbury, NY

Citation

Simons, D. , Chi, P. , Downing, R. and Lamaze, G. (1995), The Development of Standard Reference Material 2137 - A Boron Implant in Silicon Standard for Secondary Ion Mass Spectrometry, AIP Press, Woodbury, NY (Accessed April 16, 2024)
Created December 1, 1995, Updated February 19, 2017