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A single-atom-thick sheet of carbon known as graphene has remarkable properties on its own, but things can get even more interesting when you stack up multiple
Max Planck, one of the Twentieth Century’s most eminent physicists, observed, "An experiment is a question that science poses to Nature, and a measurement is
Optical systems that operate at wavelengths in the ultraviolet (UV) and extreme-ultraviolet (EUV) are susceptible to degradation by a number of different
Since 1970, the National Institute of Standards and Technology (NIST) has awarded Precision Measurement Grants for significant research in the field of
In the vacuum ultraviolet and extreme ultraviolet (EUV), the indices of refraction of all materials become complex: N = n + ik, or N = 1- d + ik. Here, n is the
Tunnel junctions, single electron transistors and superconducting resonators are fabricated using ultra-high vacuum metals’ deposition and in situ low energy
Albert Davydov, Yaw S. Obeng, Ndubuisi George Orji, Umberto Celano, Daniel Schmidt, Carlos Beitia
The international roadmap of devices and systems (IRDS) projects that 2D materials will be inserted into high-volume manufacturing as channel materials, mostly
Olga Ridzel, Wataru Yamane, Ishiaka Mansaray, John S. Villarrubia
We are beginning projects to validate the physics models used for interpretation of electron microscopy images. In one, we will measure electron yields and
Robert F. Berg, Charles S. Tarrio, Thomas B. Lucatorto
We present measurements and a model of aluminum oxidation induced by ultraviolet (UV) radiation. Spots of oxide were grown by focusing synchrotron radiation
An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines
The new beamline 10, currently under construction, is intended for applications that make use of the super-thermal brightness from SURF in the near- to mid
Beamline 5 of the Synchrotron Ultraviolet Radiation Facility is a diagnostics end-station used to determine the transverse size of the stored electron beam. The
The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then
Beamline 8 is used to study the degradation of surfaces that are irradiated by EUV radiation in the presence of common outgas species. Its multilayer mirror