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Wet Chemistry

Our multi-bench wet chemistry tool set includes RCA clean baths, KOH etching, HF vapor etching, hot solvent spray lift-off, and critical point drying.


Spray Solvent Liftoff: Microprocess Technology Avenger

Heated spray solvent tool provides users with automatic metal lift-off processing.

  • Automatic recipe controlMicroprocess Technology Avenger
  • Reduced liftoff times versus manual processing
  • Dry wafer in, dry wafer out process
  • Reduced user solvent exposure
  • Substrates from pieces to 150 mm wafers
  • Quick change rotor system
Applications:
  • Metal liftoff
  • Resist strip

Heated Wet Chemical Bench: 6-ft

This bench is used to etch and clean samples.

  • 183 cm (72 in) Open Wet Bench.6 ft Heated Wet Chemical Bench
  • Contains 2 dip tanks, two reflux quartz heated baths, glove rinse, DI and N2 spray guns, GFCI 120 VAC receptacle, and two safety eyewash stations.
  • Capable of handling small samples up to a full cassette of 6" wafers.
  • Tank 1: Dip tank with lid (Buffered Oxide Etch-BOE)
  • Tank 2: Reflux heated bath (RCA Standard Clean 1-SC1)
  • Tank 3: Dip Tank with lid (2% HF)
  • Tank 4: Dump Rinse with lid
  • Tank 5: Reflux heated bath (RCA Standard Clean 2-SC2)
  • It is located in an ultra-clean CMOS-compatible area and is subject to strict restrictions to prevent cross contamination.
Applications:
  • This tool is used for the "RCA" cleaning of wafers to remove organic and metallic surface contaminants.
  • BOE to etch silicon dioxides
Demonstrated use: Etching of patterned oxide; Contaminant removal; Wafer reclaim


Heated Wet Chemical Bench: 8-ft

This bench is used to etch and clean samples.

  • 244 cm (96 in) Open Wet Bench.8 ft Heated wet chemical bench
  • Contains 4 dip tanks, 4 reflux quartz heated baths, glove rinse, DI and N2 spray guns, GFCI 120 VAC receptacle, and two safety eyewash stations.
  • Capable of handling small samples up to a full cassette of 150 mm (6 in) wafers.
  • Tank 1: Dip tank with lid (Buffered Oxide Etch-BOE).
  • Tank 2: Reflux heated bath (RCA Standard Clean 1-SC1).
  • Tank 3: Dip Tank with lid (2% HF).
  • Tank 4: Dump Rinse with lid.
  • Tank 5: Reflux heated bath (RCA Standard Clean 2-SC2).
  • Tank 6 and 8: small volume dip tanks for 100 mm (4 in) wafer cassettes and samples.
  • Tank 7 and 9: small volume quartz heated baths for 100 mm (4 in) wafers cassettes and samples.
Applications:
  • This tool is used for the "RCA" cleaning of wafers to remove organic and metallic surface contaminants.
  • BOE to etch silicon dioxides
Demonstrated use: Demonstrated use: Etching of patterned oxide; Contaminant removal; Wafer reclaim


Spin Rinse Dryers: Semitool PSC-101

These two tools are used for the DI water rinsing and spin-drying of the wafers after RCA cleaning.

  • Cassettes for 75 mm, 100 mm, and 150 mm (3 in, 4 in, and 6 in) wafersSpin Rinse Dryer
  • Programmable recipes for rinse, quality rinse, purge and two dry cycles

KOH Wet Etch Bench
KOH Wet Etch Bench: Reynoldstech

Acid Etch Bench
Acid Etch Bench: Reynoldstech

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